Art
J-GLOBAL ID:200902015482511740
Reference number:91A0563369
Thin Film SOI Formation by Solid Phase Epitaxy using Local Doping Technique.
局所ドーピング法による固相成長薄膜SOIの形成
-
Publisher site
Copy service
{{ this.onShowCLink("http://jdream3.com/copy/?sid=JGLOBAL&noSystem=1&documentNoArray=91A0563369©=1") }}
-
Access JDreamⅢ for advanced search and analysis.
{{ this.onShowJLink("http://jdream3.com/lp/jglobal/index.html?docNo=91A0563369&from=J-GLOBAL&jstjournalNo=Y0054A") }}
Author (4):
,
,
,
Material:
Volume:
38th
Issue:
Pt 2
Page:
615
Publication year:
Mar. 1991
JST Material Number:
Y0054A
Document type:
Proceedings
Country of issue:
Japan (JPN)
Language:
JAPANESE (JA)
Terms in the title (4):
Terms in the title
Keywords automatically extracted from the title.
,
,
,
Return to Previous Page