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ArticleJ-GLOBAL ID:200902015520561390整理番号:91A0052034

Polarized light scattering by silicon oxide thin film edge on silicon: an experimental approach for thin film thickness determination.

シリコン上の酸化シリコン薄膜のエッジによる偏光散乱 薄膜厚さ測定のための実験法

著者:CHAO S(National Tsing Hua Univ., Hsin‐Chu, TWN)、CHEN J‐S(National Science Council, Hsin‐Chu, TWN)
資料名:Meas Sci Technol 巻:1 号:11 ページ:1237-1243
発行年:1990年11月
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