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ArticleJ-GLOBAL ID:200902015523797220整理番号:90A0657571

プラズマCVD法によるSiN膜の内部応力とカーボン添加による電気的特性の改善

Internal stress of plasma-deposited silicon nitride films and improvement of electrical properties by carbon addition.

著者:安井寛治(長岡技科大 工)、加藤博久(長岡技科大 工)、福田航一(長岡技科大 工)・・・
資料名:電子情報通信学会論文誌 C-2 巻:72 号:7 ページ:748-754
発行年:1989年07月
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