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ArticleJ-GLOBAL ID:200902015528531970整理番号:89A0460845

薄膜成長過程のシミュレーション

Simulation for growth process of thin films.

著者:小口多美夫(金材技研)、原久美子(富士通研 厚木研)、池田稔(富士通研 厚木研)・・・
資料名:日本応用磁気学会研究会資料 巻:59th ページ:9-15
発行年:1989年03月
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