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ArticleJ-GLOBAL ID:200902015542758863整理番号:86A0185337

Fast electron pattern generator-high resolution: A variable shaped beam system for submicron writing.

高解像度高速度電子パターニング装置 サブミクロン書込み用可変成形ビーム装置

著者:DE CHAMBOST E(Thomson‐CSF, France)、FRICHET A(Thomson‐CSF, France)、CHARTIER M(Thomson‐CSF, France)・・・
資料名:J Vac Sci Technol B 巻:4 号:1 ページ:78-82
発行年:1986年01月
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J-GLOBAL: Linking, Expanding and Sparking

About J-GLOBAL

Linking

J-GLOBAL links information that represents the key to research and development. For example, linking articles and patents with people (authors and inventors) enables the extraction of a sequence of information.
It’s useful for making new discoveries and uncovering new information.

Expanding

The system enables searches of similar kinds of content through linkage with external sites.
It helps you to obtain knowledge from dissimilar fields and discover concepts that cross the boundaries of specialisms.

Sparking

Through repeated linkage and expansioniteration, J-GLOBAL provides unexpected hints for problem-solving and the illumination of new ideas.