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ArticleJ-GLOBAL ID:200902015543370044整理番号:89A0070421

Kinetics of the room-temperatue air oxidation of hydrogenated amorphous silicon and crystalline silicon.

水素化アモルファスけい素及び結晶けい素の室温空気酸化の速度論

著者:LU Z H(<span style=text-decoration:overline>E ́</span>cole Polytechnique de Montr<span style=text-decoration:overline>e ́</span>al, Qu<span style=text-decoration:overline>e ́</span>bec, CAN)、SACHER E(<span style=text-decoration:overline>E ́</span>cole Polytechnique de Montr<span style=text-decoration:overline>e ́</span>al, Qu<span style=text-decoration:overline>e ́</span>bec, CAN)、YELON A(<span style=text-decoration:overline>E ́</span>cole Polytechnique de Montr<span style=text-decoration:overline>e ́</span>al, Qu<span style=text-decoration:overline>e ́</span>bec, CAN)
資料名:Philos Mag B 巻:58 号:4 ページ:385-388
発行年:1988年10月
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