Art
J-GLOBAL ID：200902015544376615   Reference number：84A0246551

A novel bilevel resist system.

新しい二レベルレジスト系
Author (3)：
MCCULLOUGH A W

About MCCULLOUGH A W

(Perkin-Elmer Corp., Connecticut)

About Perkin-Elmer Corp., Connecticut

, 
PAVELCHEK E

About PAVELCHEK E

(Perkin-Elmer Corp., Connecticut)

About Perkin-Elmer Corp., Connecticut

, 
WINDISCHMANN H

About WINDISCHMANN H

(Perkin-Elmer Corp., Connecticut)

About Perkin-Elmer Corp., Connecticut


Material：
Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures  (Journal of Vacuum Science & Technology. B. Microelectronics Processing and Phenomena)

About Journal of Vacuum Science & Technology. B. Microelectronics and Nanometer Structures


Volume： 1  Issue： 4  Page： 1241-1246  Publication year： Oct. 1983 
JST Material Number： E0974A  ISSN： 1071-1023  CODEN： JVTBD9  Document type： Article
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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photoresist

About photoresist

,...
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JST classification (3)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

,  Radiation polymer chemistry 
(CG03050S)

About Radiation polymer chemistry

,  Other particle optics 
(BD02080I)

About Other particle optics

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レジスト

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