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ArticleJ-GLOBAL ID:200902015551563536整理番号:87A0153451

Numerical simulation of the flow, temperature, and concentration fields in a radio frequency plasma CVD reactor.

高周波プラズマCVD反応器における流れ,温度,濃度場の数値シミュレーション

著者:ZHAO G‐Y(Inst. Mechanics, Chinese Academy of Sciences, Beijing, CHN)、ZHU C‐W(Inst. Mechanics, Chinese Academy of Sciences, Beijing, CHN)
資料名:IEEE Trans Plasma Sci 巻:14 号:4 ページ:531-537
発行年:1986年08月
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