Rate constant measurements for reactions of SiH3 with O2, NO and NO2 using time-resolved infrared diode laser spectroscopy.

SUGAWARA K; NAKANAGA T; TAKEO H; MATSUMURA C

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J-GLOBAL ID：200902015573376373 Reference number：89A0388295

Rate constant measurements for reactions of SiH₃ with O₂, NO and NO₂ using time-resolved infrared diode laser spectroscopy.

時間分解赤外ダイオードレーザ分光を用いたSiH₃のO₂,NO,NO₂との反応に対する速度定数の測定

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Author (4)： , , ,
Material：
Volume： 157 Issue： 4 Page： 309-314 Publication year： May. 12, 1989
JST Material Number： B0824A ISSN： 0009-2614 Document type： Article
Article type：短報 Country of issue： Netherlands (NLD) Language： ENGLISH (EN)

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Atomic reaction and radical reaction

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