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ArticleJ-GLOBAL ID:200902015578316433整理番号:88A0120521

Layers of Al2O3 deposited on nonheated substrates by way of crystallization of pulse plasma ablation.

パルスプラズマアブレーションの結晶化法により非加熱基材上に蒸着させたAl2O3

著者:ROMANOWSKI Z(Warsaw Univ., Warsaw, POL)
資料名:Ceram Clin Appl ページ:111-115
発行年:1987年
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