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ArticleJ-GLOBAL ID:200902015589358057整理番号:85A0129162

Microstructural investigations of refractory metal silicide films on silicon.

Si面上の高融点金属けい化物膜の微細組織の研究

著者:MAGEE T J(Advanced Research and Applications Corp., California)、WOOLHOUSE G R(Advanced Research and Applications Corp., California)、KAWAYOSHI H A(Advanced Research and Applications Corp., California)・・・
資料名:J Vac Sci Technol B 巻:2 号:4 ページ:756-761
発行年:1984年10月
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About J-GLOBAL

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The system enables searches of similar kinds of content through linkage with external sites.
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