Art
J-GLOBAL ID：200902015589639919   Reference number：90A0726651

In-situ develop end point control to eliminate CD variance.

限界寸法変動を減少させるためのその場での現像終点制御
Author (1)：
THOMSOM M

About THOMSOM M

(Xinix, Inc., CA)

About Xinix, Inc., CA


Material：
Proceedings of SPIE  (Proceedings. SPIE - The International Society for Optical Engineering)

About Proceedings of SPIE


Volume： 1261  Page： 512-525  Publication year： 1990 
JST Material Number： D0943A  ISSN： 0277-786X  CODEN： PSISDG  Document type： Proceedings
Article type： 原著論文  Country of issue： United States (USA)  Language： ENGLISH (EN)
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Keywords indexed to the article.
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photoresist

About photoresist

,...
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

,  Interferometry and interferometers 
(BD07070G)

About Interferometry and interferometers

Terms in the title (3)：
Terms in the title
Keywords automatically extracted from the title.
限界寸法

About 限界寸法

, 
現像

About 現像

, 
終点

About 終点


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