Art
J-GLOBAL ID：200902015590135568
Reference number：85A0250679
Systematic design of an electrostatic optical system for ion beam lithography.
イオンビームリソグラフィー用静電光学系の系統的な設計
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Author (4)：
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Material：
Volume：
3
Issue：
1
Page：
75-81
Publication year：
Jan. 1985
JST Material Number：
E0974A
ISSN：
1071-1023
CODEN：
JVTBD9
Document type：
Article
Article type：
原著論文
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
Thesaurus term：
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Applications of electron beams and ion beams
, Electron and ion beams
Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
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