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ArticleJ-GLOBAL ID:200902015602951170整理番号:83A0023360

Residual stresses and scaling CNTD SiC to larger sizes.

残留応力とCNTD炭化けい素の大サイズへのスケーリング

著者:RICE R W(Naval Research Lab., Washington,D.C.)、McKINNEY K R(Naval Research Lab., Washington,D.C.)
資料名:J Mater Sci Lett 巻:1 号:4 ページ:159-162
発行年:1982年04月
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