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ArticleJ-GLOBAL ID:200902015603327704整理番号:86A0185295

Collisional processes induced in the n=3 helium sublevels by electrons in a low-pressure plasma. Application to the electron density measurement.

低圧プラズマ内で電子によってヘリウムのn=3副準位内に生じる衝突過程 電子密度測定への応用

著者:DUBREUIL B(Univ. Orleans, France)、PRIGENT P(Univ. Orleans, France)
資料名:J Phys B 巻:18 号:23 ページ:4597-4611
発行年:1985年12月14日
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