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ArticleJ-GLOBAL ID:200902015625598094整理番号:85A0221075

現場のためのフォトレジスト技術 第4回Deep UV用レジスト

Photoresist technology for workshop application 4. Photo resist for deep UV.

著者:横田晃(東京応化工業)、小原秀克(東京応化工業)
資料名:月刊Semiconductor World 巻:4 号:3 ページ:116-119
発行年:1985年03月
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J-GLOBAL: Linking, Expanding and Sparking

About J-GLOBAL

Linking

J-GLOBAL links information that represents the key to research and development. For example, linking articles and patents with people (authors and inventors) enables the extraction of a sequence of information.
It’s useful for making new discoveries and uncovering new information.

Expanding

The system enables searches of similar kinds of content through linkage with external sites.
It helps you to obtain knowledge from dissimilar fields and discover concepts that cross the boundaries of specialisms.

Sparking

Through repeated linkage and expansioniteration, J-GLOBAL provides unexpected hints for problem-solving and the illumination of new ideas.