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ArticleJ-GLOBAL ID:200902015627227530整理番号:92A0431690

70nm Poly‐Siゲート加工

70nm Poly-Si Gate Etching.

著者:須藤敬己(広島大 集積化システム研セ)、橋本剛(広島大 集積化システム研セ)、奈良井哲(広島大 工)・・・
資料名:応用物理学関係連合講演会講演予稿集 巻:39th 号:Pt 2 ページ:508
発行年:1992年03月
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