Art
J-GLOBAL ID：200902015628534321   Reference number：91A0612074

Secondary dissociation pathways of ethylsilylene radical on ground and excited state potential energy surfaces.

基底及び励起状態ポテンシャルエネルギー曲面上のエチルシリレンラジカルの二次解離経路
Author (1)：
FRANCISCO J S

About FRANCISCO J S

(Wayne State Univ., MI, USA)

About Wayne State Univ., MI, USA


Material：
Molecular Physics  (Mol Phys)

About Molecular Physics


Volume： 73  Issue： 1  Page： 235-240  Publication year： May. 1991 
JST Material Number： E0336A  ISSN： 0026-8976  CODEN： MOPHAM  Document type： Article
Article type： 短報  Country of issue： United Kingdom (GBR)  Language： ENGLISH (EN)
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silylene

About silylene

,...
Semi thesaurus term：
Thesaurus term/Semi thesaurus term
Keywords indexed to the article.
All keywords is available on JDreamIII(charged).
On J-GLOBAL, this item will be available after more than half a year after the record posted. In addtion, medical articles require to login to MyJ-GLOBAL.
MP4SDQ法

About MP4SDQ法

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Atomic reaction and radical reaction 
(CB06030C)

About Atomic reaction and radical reaction

Terms in the title (5)：
Terms in the title
Keywords automatically extracted from the title.
基底

About 基底

, 
励起状態

About 励起状態

, 
ポテンシャルエネルギー曲面

About ポテンシャルエネルギー曲面

, 
解離

About 解離

, 
経路

About 経路


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