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ArticleJ-GLOBAL ID:200902015638554746整理番号:88A0496583

The effect of heat treatment on redistribution of fast diffusing impurities in polycrystalline silicon.

多結晶Si中に急速に拡散する不純物の再分布に対する熱処理の効果

著者:KUMAR R(National Physical Lab., New Delhi, IND)、KOTNALA R K(National Physical Lab., New Delhi, IND)、ARORA N K(National Physical Lab., New Delhi, IND)・・・
資料名:J Appl Phys 巻:64 号:2 ページ:942-944
発行年:1988年07月15日
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