The effect of heat treatment on redistribution of fast diffusing impurities in polycrystalline silicon.

KUMAR R; KOTNALA R K; ARORA N K; DAS B K

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J-GLOBAL ID：200902015638554746 Reference number：88A0496583

The effect of heat treatment on redistribution of fast diffusing impurities in polycrystalline silicon.

多結晶Si中に急速に拡散する不純物の再分布に対する熱処理の効果

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Author (4)： , , ,
Material：
Volume： 64 Issue： 2 Page： 942-944 Publication year： Jul. 15, 1988
JST Material Number： C0266A ISSN： 0021-8979 CODEN： JAPIAU Document type： Article
Article type：短報 Country of issue： United States (USA) Language： ENGLISH (EN)

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Diffusion in solids in general

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