Art
J-GLOBAL ID：200902015650421662
Reference number：92A0219998
Surface CoSi2 layers by moderate dose cobalt implantation for self-aligned contacts.
自己整合接触のための中程度のドーズのCoイオン注入による表面CoSi2層
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Author (1)：
Material：
Volume：
71
Issue：
3
Page：
1248-1252
Publication year：
Feb. 01, 1992
JST Material Number：
C0266A
ISSN：
0021-8979
CODEN：
JAPIAU
Document type：
Article
Article type：
原著論文
Country of issue：
United States (USA)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
半導体-金属接触【’81~’92】
, Metallic thin films
Terms in the title (3)：
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Keywords automatically extracted from the title.
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