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ArticleJ-GLOBAL ID:200902015652327191整理番号:88A0396559

Printability of mask defects in negative resist projection photolithography.

ネガ型レジスト投影フォトリソグラフィーにおけるマスク欠陥のプリンタビリティ

著者:RAMAMURTHY S(Semiconductor Complex Ltd., Punjab, IND)、KUMAR R(Semiconductor Complex Ltd., Punjab, IND)、SINGH D N(Semiconductor Complex Ltd., Punjab, IND)
資料名:Microelectron Reliab 巻:28 号:3 ページ:345-351
発行年:1988年
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