Art

J-GLOBAL ID：200902015655660444   Reference number：93A0882089

Contamination control in silicon device manufacturing by diffusion length measurements and deep level spectroscopy.

Author (2)： ZOTH G (Siemens AG, Munich, DEU) ,  BERGHOLZ W (Siemens AG, Munich, DEU)
Material： Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices, 1991  (Proc Symp Diagn Tech Semicond Mater Devices 1991)
Page： 88-100  Publication year： 1992 
JST Material Number： K19930526  ISBN： 1-56677-001-7  Document type： Proceedings
Country of issue： United States (USA)  Language： ENGLISH (EN)