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ArticleJ-GLOBAL ID:200902015658231684整理番号:93A0096761

X-ray photoelectron spectroscopic studies of chemical vapor deposition with TaF5 precursor on polyimide surfaces.

ポリイミド表面上のTaF5前駆体による化学蒸着のX線光電子分光法による研究

著者:UGOLINI D(IBM Thomas J. Watson Research Center, New York)、KOWALCZYK S P(IBM Thomas J. Watson Research Center, New York)、MCFEELY F R(IBM Thomas J. Watson Research Center, New York)
資料名:J Appl Phys 巻:72 号:10 ページ:4912-4917
発行年:1992年11月15日
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