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ArticleJ-GLOBAL ID:200902015661443250整理番号:82A0457467

Transport profiles, the influence of internal stress and potential fluctuations in thin silicon films on sapphire.

サファイア上のシリコン薄膜の輸送プロフィールとそれへの内部応力およびポテンシャルのゆらぎの影響

著者:LEE J‐H(Inst. National Polytechnique Grenoble, France)、CRISTOLOVEANU S(Inst. National Polytechnique Grenoble, France)、CHOVET A(Inst. National Polytechnique Grenoble, France)
資料名:Thin Solid Films 巻:89 号:1 ページ:13-18
発行年:1982年03月05日
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