Hydrogenated amorphous silicon films prepared in cascaded glow discharge reactors.

PANWAR O S; DIXIT P N; BHATTACHARYYA R; SHAH V V

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J-GLOBAL ID：200902015663524150 Reference number：86A0197853

Hydrogenated amorphous silicon films prepared in cascaded glow discharge reactors.

カスケード型グロー放電反応器で作製した水素化非晶質シリコン薄膜

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Material：
Volume： 59 Issue： 5 Page： 1578-1586 Publication year： Mar. 01, 1986
JST Material Number： C0266A ISSN： 0021-8979 CODEN： JAPIAU Document type： Article
Article type：原著論文 Country of issue： United States (USA) Language： ENGLISH (EN)

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Semiconductor thin films , Photoconduction,photoelectromotive force

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