Art
J-GLOBAL ID：200902015668588696
Reference number：86A0445383
Investigation of gallium selenide films, grown by the hot wall method, on silicon substrates.
けい素下地上に熱い壁法により成長したセレン化ガリウム膜
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Author (4)：
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Material：
Volume：
94
Issue：
2
Page：
K129-K132,877(2)
Publication year：
Apr. 1986
JST Material Number：
D0774A
ISSN：
0031-8965
Document type：
Article
Article type：
短報
Country of issue：
Germany, Federal Republic of (DEU)
Language：
ENGLISH (EN)
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Semiconductor thin films
Terms in the title (4)：
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