Art
J-GLOBAL ID：200902015670658839
Reference number：85A0023107
Oxygen effect on secondary ion yield in oxygen-doped silicon.
酸素ドープしたシリコンの二次イオン収率に及ぼす酸素の影響
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Author (3)：
,
,
Material：
Page：
98-100
Publication year：
1984
JST Material Number：
K19840471
ISBN：
0-387-13316-X
Document type：
Proceedings
Article type：
短報
Country of issue：
Germany, Federal Republic of (DEU)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Mass spectrometry
, Surface structure of solids in general
Terms in the title (4)：
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,
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