Art
J-GLOBAL ID：200902015712877366
Reference number：83A0013940
Gas mixing effect on ion current spectrum and its application to optimize implantation source gas composition.
イオン電流スペクトルに及ぼすガス混合効果とインプランテーション源のガス組成の最適化への応用
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Author (2)：
,
Material：
Volume：
21
Issue：
4
Page：
633-635
Publication year：
Apr. 1982
JST Material Number：
G0520B
ISSN：
0021-4922
Document type：
Article
Article type：
原著論文
Country of issue：
Japan (JPN)
Language：
ENGLISH (EN)
Thesaurus term：
Thesaurus term/Semi thesaurus term
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Electron and ion sources
Terms in the title (7)：
Terms in the title
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