Art
J-GLOBAL ID：200902015735086331   Reference number：92A0408450

Achieving high-quality ULSI gate oxides: AN examination of some relevant factors.

高品質のULSIゲート酸化膜の実現 関連要素の検討
Author (1)：
HEYNS M M

About HEYNS M M

(Interuniv. Microelectronics Center(IMEC), Kapeldreef, BEL)

About Interuniv. Microelectronics Center(IMEC), Kapeldreef, BEL


Material：
Microcontamination

About Microcontamination


Volume： 9  Issue： 4  Page： 29-34,87-89  Publication year： Apr. 1991 
JST Material Number： D0679B  ISSN： 0738-713X  Document type： Article
Article type： 解説  Country of issue： United States (USA)  Language： ENGLISH (EN)
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VLSI

About VLSI

,...
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Thesaurus term/Semi thesaurus term
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ULSI

About ULSI

,...
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JST classification (1)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

About Manufacturing technology of solid-state devices

Terms in the title (4)：
Terms in the title
Keywords automatically extracted from the title.
高品質

About 高品質

, 
ULSI

About ULSI

, 
ゲート酸化膜

About ゲート酸化膜

, 
要素

About 要素


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