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ArticleJ-GLOBAL ID:200902018897073623整理番号:85A0521697

Resistance fluctuations due to hydrogen diffusion in niobium thin films.

水素拡散によるニオブ薄膜の抵抗ゆらぎ

著者:SCOFIELD J H(Cornell Univ., New York)、WEBB W W(Cornell Univ., New York)
資料名:Phys Rev Lett 巻:54 号:4 ページ:353-356
発行年:1985年01月28日
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