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J-GLOBAL ID：200902018913453300   Reference number：91A0603866

Resist material for microlithography.

マイクロリソグラフィー用レジスト材料
Author (1)：
UEDA MITSURU

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(山形大 工)

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Material：
表面(表面談話会・コロイド懇話会)  (Reviews and Topics on Surface Science & Technology Avant-Garde)

About 表面(表面談話会・コロイド懇話会)


Volume： 29  Issue： 7  Page： 534-545  Publication year： Jul. 1991 
JST Material Number： G0745A  ISSN： 0367-648X  Document type： Article
Article type： 解説  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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photoresist

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,...
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crosslinking

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JST classification (2)：
JST classification
Category name(code) classified by JST.
Reaction of polymers with low molecular weight compounds 
(CG03020L)

About Reaction of polymers with low molecular weight compounds

,  Manufacturing technology of solid-state devices 
(NC03030V)

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マイクロリソグラフィー

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レジスト材料

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