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ArticleJ-GLOBAL ID:200902019049334995整理番号:89A0411692

ECR水素プラズマ処理による半導体表面のIn‐Situクリーニング

In-situ surface cleaning of semiconductor surfaces with ECR hydrogen plasma.

著者:末宗幾夫(広島大 工)、国次恭宏(広島大 工)、浜岡和彦(広島大 工)・・・
資料名:電子情報通信学会技術研究報告 巻:89 号:111(SDM89 34-48) ページ:25-26
発行年:1989年06月26日
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