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ArticleJ-GLOBAL ID:200902019133447118整理番号:82A0284424

Magnetron sputtering with additional ionization effect by electron beam.

電子線による付加的イオン化の影響をうけるマグネトロンスパッタリング

著者:ADACHI R(Osaka Vacuum Chemical Co., Ltd.)、TAKESHITA K(Osaka Vacuum Chemical Co., Ltd.)
資料名:J Vac Sci Technol 巻:20 号:1 ページ:98-99
発行年:1982年01月
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J-GLOBAL: Linking, Expanding and Sparking

About J-GLOBAL

Linking

J-GLOBAL links information that represents the key to research and development. For example, linking articles and patents with people (authors and inventors) enables the extraction of a sequence of information.
It’s useful for making new discoveries and uncovering new information.

Expanding

The system enables searches of similar kinds of content through linkage with external sites.
It helps you to obtain knowledge from dissimilar fields and discover concepts that cross the boundaries of specialisms.

Sparking

Through repeated linkage and expansioniteration, J-GLOBAL provides unexpected hints for problem-solving and the illumination of new ideas.