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ArticleJ-GLOBAL ID:200902019143200757整理番号:83A0330080

Oxidation of oxalic acid in aqueous suspensions of semiconductors illuminated with UV or visible light.

UVまたは可視光で照射した半導体の懸濁水溶液中のしゅう酸の酸化

著者:HERRMANN J‐M(Inst. Recherches sur la Catalyse, Centre National de la Recherche Scientifique, France)、MOZZANEGA M‐N(Inst. Recherches sur la Catalyse, Centre National de la Recherche Scientifique, France)、PICHAT P(Inst. Recherches sur la Catalyse, Centre National de la Recherche Scientifique, France)
資料名:J Photochem 巻:22 号:4 ページ:333-343
発行年:1983年08月
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