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ArticleJ-GLOBAL ID:200902023120194951整理番号:92A0446009

Si MOS蓄積層における電子移動度

Electron Mobility in Si MOS Accumulation Layers.

著者:稲葉聡(東芝)、高木信一(東芝)、谷本弘吉(東芝)・・・
資料名:応用物理学関係連合講演会講演予稿集 巻:39th 号:Pt 2 ページ:733
発行年:1992年03月
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