Art
J-GLOBAL ID：200902023183205074
Reference number：89A0253661
Very-low-temperature thin-film formation technology by a low-kinetic-energy particle process.
低運動エネルギー粒子のプロセスによる極低温での薄膜調製技術
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Author (2)：
,
Material：
Volume：
37/38
Page：
794-798
Publication year：
Feb. 1989
JST Material Number：
H0899A
ISSN：
0168-583X
Document type：
Article
Article type：
原著論文
Country of issue：
Netherlands (NLD)
Language：
ENGLISH (EN)
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JST classification (2)：
JST classification
Category name(code) classified by JST.
Metallic thin films
, Interactions with ions
Terms in the title (5)：
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