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J-GLOBAL ID:200902023207126600   Reference number:87A0279974

Preparation of titanium carbide films by RF plasma enhanced chemical vapour deposition method.

プラズマCVD法による炭化チタン膜の形成
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Volume: 37  Issue:Page: 311-317  Publication year: Dec. 1986 
JST Material Number: F0250A  ISSN: 0472-142X  CODEN: OKGKA  Document type: Article
Article type: 原著論文  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Thin films of other inorganic compounds 
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