About J-GLOBAL

日本語

Font size
  • A
  • A

Articleの詳細情報

ArticleJ-GLOBAL ID:200902023207126600整理番号:87A0279974

プラズマCVD法による炭化チタン膜の形成

Preparation of titanium carbide films by RF plasma enhanced chemical vapour deposition method.

著者:望月昭一(大阪工技試)、真壁遼治(大阪工技試)、中島貞夫(大阪工技試)
資料名:大阪工業技術試験所季報 巻:37 号:4 ページ:311-317
発行年:1986年12月
  • J-GLOBAL home
  • Bookmark J-GLOBAL

J-GLOBAL: Linking, Expanding and Sparking

About J-GLOBAL

Linking

J-GLOBAL links information that represents the key to research and development. For example, linking articles and patents with people (authors and inventors) enables the extraction of a sequence of information.
It’s useful for making new discoveries and uncovering new information.

Expanding

The system enables searches of similar kinds of content through linkage with external sites.
It helps you to obtain knowledge from dissimilar fields and discover concepts that cross the boundaries of specialisms.

Sparking

Through repeated linkage and expansioniteration, J-GLOBAL provides unexpected hints for problem-solving and the illumination of new ideas.