Art
J-GLOBAL ID：200902023220063838
Reference number：85A0435696
Grundlagen der Elektrodiffusion zur Zuverlaessigkeitsverbesserung von Al-Leitbahnen fuer hochintegrierte Schaltungen.
集積回路のAl導体の信頼性向上に対する電気化学的拡散の原理
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Author (1)：
Material：
Issue：
54
Page：
250P
Publication year：
1985
JST Material Number：
B0555A
ISSN：
0178-9422
Document type：
Article
Article type：
原著論文
Country of issue：
Germany, Federal Republic of (DEU)
Language：
GERMAN (DE)
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