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ArticleJ-GLOBAL ID:200902023232903750整理番号:86A0184900

SIMS depth profiling of multilayer metal-oxide thin films-improved accuracy using a xenon primary ion.

SIMSによる多層金属‐酸化物薄膜の深さ分布測定―キセノン1次イオン使用による精度向上

著者:MCINTYRE N S(Univ. Western Ontario, Canada)、JOHNSTON D(Univ. Western Ontario, Canada)、CHAUVIN W J(Univ. Western Ontario, Canada)・・・
資料名:Nucl Instrum Method Phys Res Sect B Beam Interact Mater At 巻:12 号:3 ページ:389-395
発行年:1985年10月
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