Art
J-GLOBAL ID:200902023243011720
Reference number:92A0168747
Reactive-ion etching of tungsten silicide using NF3 gas mixtures.
NF3混合ガスによるけい化タングステンの反応性イオンエッチング
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Author (2):
,
Material:
Volume:
9
Issue:
6
Page:
2747-2751
Publication year:
Nov. 1991
JST Material Number:
E0974A
ISSN:
1071-1023
CODEN:
JVTBD9
Document type:
Article
Article type:
原著論文
Country of issue:
United States (USA)
Language:
ENGLISH (EN)
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JST classification (2):
JST classification
Category name(code) classified by JST.
Applications of plasma
, Manufacturing technology of solid-state devices
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,
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