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J-GLOBAL ID:200902023266281600   Reference number:91A0568901

Measurement of the Thermal Diffusivity of Thin Films on Substrate by the Photoacoustic Method. 4th Report, Construction of high-frequency cell and measurements of sputtering Ti thin films.

光音響法による基板上薄膜の温度伝導率測定の研究 第4報, 高周波用セルの製作およびスパッタリングTi薄膜の測定
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Volume: 28th  Issue: Pt 3  Page: 856-858  Publication year: 1991 
JST Material Number: F0872C  Document type: Proceedings
Article type: 原著論文  Country of issue: Japan (JPN)  Language: JAPANESE (JA)
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Measurement,testing and reliability of solid-state devices 

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