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ArticleJ-GLOBAL ID:200902023305257739整理番号:82A0058275

Electrical characteristics of Al contact to NiSi using thin W layer as a barrier.

Wの薄層を障壁として用いたNiSiへのAl接触の電気的特性

著者:BARTUR M(California Inst. Technology)、NICOLET M‐A(California Inst. Technology)
資料名:Appl Phys Lett 巻:39 号:10 ページ:822-824
発行年:1981年11月15日
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