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ArticleJ-GLOBAL ID:200902023312646848整理番号:85A0234265

Fast diffusion of As in polycrystalline silicon during rapid thermal annealing.

急速な熱アニール中のシリコン多結晶におけるAsの急速拡散

著者:WILSON S R(Motorola Inc., Arizona)、PAULSON W M(Motorola Inc., Arizona)、GREGORY R B(Motorola Inc., Arizona)・・・
資料名:Appl Phys Lett 巻:45 号:4 ページ:464-466
発行年:1984年08月15日
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About J-GLOBAL

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J-GLOBAL links information that represents the key to research and development. For example, linking articles and patents with people (authors and inventors) enables the extraction of a sequence of information.
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The system enables searches of similar kinds of content through linkage with external sites.
It helps you to obtain knowledge from dissimilar fields and discover concepts that cross the boundaries of specialisms.

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Through repeated linkage and expansioniteration, J-GLOBAL provides unexpected hints for problem-solving and the illumination of new ideas.