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J-GLOBAL ID:200902051268569338   Reference number:86A0057465

Ellipsometric studies of silicon dioxide films on silicon.

けい素上の二酸化けい素膜のエリプリメトリー
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Volume: 25  Issue:Page: 297-305  Publication year: Aug. 1985 
JST Material Number: D0205C  ISSN: 0376-4583  Document type: Article
Article type: 原著論文  Country of issue: Switzerland (CHE)  Language: ENGLISH (EN)
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Oxide thin films 
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