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ArticleJ-GLOBAL ID:200902131012874790整理番号:95A0093491

High rate deposition of SiO2 on large-scale glass by dc arc plasma enhanced CVD.

DCアークプラズマ促進CVDによる大規模ガラス上のSiO2の高速蒸着

著者:OGINO E(Nippon Sheet Glass Co., Ibaraki, JPN)、MATSUMOTO M(Nippon Sheet Glass Co., Ibaraki, JPN)、NAKAI H(Nippon Sheet Glass Co., Ibaraki, JPN)・・・
資料名:J Non-Cryst Solid 巻:178 ページ:215-219
発行年:1994年11月
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