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ArticleJ-GLOBAL ID:200902131015921713整理番号:93A0644362

Atomic diffusion dependent on structure relaxation in compositionally modulated amorphous transition metal films.

組成変調非晶質遷移金属薄膜の構造緩和に依存した原子拡散

著者:MURATA M(Gakushuin Univ., Tokyo, JPN)、MIZOGUCHI T(Gakushuin Univ., Tokyo, JPN)
資料名:Key Eng Mater 巻:81/83 ページ:297-302
発行年:1993年
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