Art
J-GLOBAL ID：200902131016248230   Reference number：94A0942158

Study of syntheses of oxide thin films.

酸化物薄膜の合成に関する研究
Author (1)：
NONAKA HIDEHIKO

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(電総研)

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Material：
Researches of the Electrotechnical Laboratory  (電子技術総合研究所研究報告)

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Issue： 962  Page： 67P  Publication year： Mar. 1994 
JST Material Number： F0015A  ISSN： 0366-9106  Document type： Article
Article type： 原著論文  Country of issue： Japan (JPN)  Language： JAPANESE (JA)
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thin film growth

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,...
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Thesaurus term/Semi thesaurus term
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酸化物薄膜

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JST classification (2)：
JST classification
Category name(code) classified by JST.
Manufacturing technology of solid-state devices 
(NC03030V)

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,  Oxide thin films 
(BK14050P)

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酸化物薄膜

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, 
研究

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