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ArticleJ-GLOBAL ID:200902131016450285整理番号:97A0503904

Ti,TiN ECR CVD膜のステップカバレッジ非対称性の改善 (1) Ti CVD

Improvement of asymmetric profile of Ti, TiN ECR CVD film. (1). Ti CVD.

著者:宮本孝章(ソニー 超LSI研)、川島淳志(ソニー 超LSI研)、門村新吾(ソニー 超LSI研)・・・
資料名:応用物理学関係連合講演会講演予稿集 巻:44th 号:2 ページ:799
発行年:1997年03月
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