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ArticleJ-GLOBAL ID:200902131020831170整理番号:93A0696916

Formation of metastable carbide and fractal structure in Co thin films by carbon ion implantation.

炭素イオン打込みCo薄膜における準安定炭化物の形成とフラクタル構造

著者:LIU B X(Tsinghua Univ., Beijing, CHN)、TAO K(Tsinghua Univ., Beijing, CHN)
資料名:Nucl Instrum Method Phys Res Sect B Beam Interact Mater At 巻:80/81 号:Pt 1 ページ:332-335
発行年:1993年06月
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About J-GLOBAL

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