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ArticleJ-GLOBAL ID:200902131022217738整理番号:97A0496982

Effect of hydrogen termination on the work of adhesion between rough polycrystalline silicon surfaces.

粗い多結晶シリコン表面間の付着仕事に対する水素終端効果

著者:HOUSTON M R(Univ. California, CA)、HOWE R T(Univ. California, CA)、MABOUDIAN R(Univ. California, CA)
資料名:J Appl Phys 巻:81 号:8, Pt.1 ページ:3474-3483
発行年:1997年04月15日
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