Art
J-GLOBAL ID:200902131022217738
Reference number:97A0496982
Effect of hydrogen termination on the work of adhesion between rough polycrystalline silicon surfaces.
粗い多結晶シリコン表面間の付着仕事に対する水素終端効果
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Author (3):
,
,
Material:
Volume:
81
Issue:
8, Pt.1
Page:
3474-3483
Publication year:
Apr. 15, 1997
JST Material Number:
C0266A
ISSN:
0021-8979
CODEN:
JAPIAU
Document type:
Article
Article type:
原著論文
Country of issue:
United States (USA)
Language:
ENGLISH (EN)
Thesaurus term:
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JST classification (2):
JST classification
Category name(code) classified by JST.
Solid-solid interface
, Surface structure of semiconductors
Terms in the title (3):
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,
,
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